王庆(1970-),男,工学博士,博士后出站人员,金沙威尼斯欢乐娱人城副教授,硕士生导师,美国University of North Texas大学访问学者。联系方式:13940400630(手机),qingwang@mail.neu.edu.cn(邮件); 主要研究方向是: (1)纳米薄膜的物理化学气相沉积; (2)机械零件的等离子体表面改性; (3)纳米薄膜的机械学性能研究。 讲授本科生课程—《过程装备控制》(课堂教学、实验);曾经获得2008冶金部科技进步3等奖,沈阳市科技进步3等奖各一项。 近期论文: [1] Wang Qing, Ba Dechun. The effect ions current density on target etching in Radio Frequency-Magnetron Sputtering Process. Plasma Science and Technology, 2012,14 [2] Swayambhu Behera, Qing Wang. The plasma pretreatment effects on oxygen plasma-induced carbon loss and surface roughening in an ultralow-k organosilicate glass film. J. Phys. D: Appl. Phys. 44 (2011) 155204 [3] Qing Wang, De-chun Ba. An investigation on hysteresis process of ZnO film deposition and changes of surface morphology and wettability Materials Letters 68 (2012) 320–323 (责任编辑:admin) |